Mr. Andreas Frangen
at Toppan Photomasks Inc
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Manufacturing, Inspection, Scanning electron microscopy, Printing, Solids, Photomasks, Critical dimension metrology, Halftones, Semiconducting wafers

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Etching, Numerical simulations, Image registration, Thermal effects, Photomasks, Semiconducting wafers, Data analysis

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Metrology, Cadmium, Calibration, Etching, Manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Lithographic illumination, Etching, Scanners, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Metrology, Deep ultraviolet, Etching, Manufacturing, Photoresist materials, Photomasks, Semiconductor manufacturing, Semiconducting wafers, 193nm lithography

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