Dr. Andreas Frommhold
R&D Engineer at imec
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 30 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Wafer-level optics, Lithography, Diffraction, Deep ultraviolet, Scanners, Manufacturing, Photomasks, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 12 May 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Optical lithography, Inspection, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 29 November 2019 Presentation + Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Metrology, Cadmium, Defect detection, Etching, Inspection, Finite element methods, Critical dimension metrology, Optical correlators, Failure analysis, Stochastic processes

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Metrology, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Metrology, Optical lithography, Statistical analysis, Etching, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Stochastic processes

Showing 5 of 23 publications
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