Dr. Andreas Rathsfeld
at WIAS
SPIE Involvement:
Conference Program Committee | Author
Publications (7)

PROCEEDINGS ARTICLE | December 18, 2012
Proc. SPIE. 8550, Optical Systems Design 2012
KEYWORDS: Diffraction, Cadmium, Optical testing, Scatterometry, Finite element methods, Extreme ultraviolet, Line width roughness, Critical dimension metrology, Line edge roughness, Edge roughness

PROCEEDINGS ARTICLE | June 17, 2009
Proc. SPIE. 7390, Modeling Aspects in Optical Metrology II
KEYWORDS: Diffraction, Deep ultraviolet, Scanning electron microscopy, Scatterometry, Monte Carlo methods, Inverse problems, Photomasks, Extreme ultraviolet, Inverse optics, Diffraction gratings

PROCEEDINGS ARTICLE | June 17, 2009
Proc. SPIE. 7390, Modeling Aspects in Optical Metrology II
KEYWORDS: Diffraction, Data modeling, Scatterometry, Monte Carlo methods, Inverse problems, Reflectometry, Finite element methods, Photomasks, Extreme ultraviolet, Reconstruction algorithms

PROCEEDINGS ARTICLE | April 25, 2008
Proc. SPIE. 6995, Optical Micro- and Nanometrology in Microsystems Technology II
KEYWORDS: Diffraction, Scatterometry, Monte Carlo methods, Inverse problems, Finite element methods, Photomasks, Extreme ultraviolet, Reconstruction algorithms, Phase shifts, Diffraction gratings

PROCEEDINGS ARTICLE | March 22, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Diffraction, Prisms, Metrology, Deep ultraviolet, Polarization, Sensors, Scatterometry, Reflectometry, Finite element methods, Photomasks

PROCEEDINGS ARTICLE | June 18, 2007
Proc. SPIE. 6617, Modeling Aspects in Optical Metrology
KEYWORDS: Diffraction, Glasses, Scatterometry, Inverse problems, Finite element methods, Photomasks, Extreme ultraviolet, Reconstruction algorithms, Condition numbers, Diffraction gratings

Showing 5 of 7 publications
Conference Committee Involvement (7)
Modeling Aspects in Optical Metrology VII
24 June 2019 | Munich, Germany
Modeling Aspects in Optical Metrology
26 June 2017 | Munich, Germany
Modeling Aspects in Optical Metrology V
23 June 2015 | Munich, Germany
Modeling Aspects in Optical Metrology IV
13 May 2013 | Munich, Germany
Modeling Aspects in Optical Metrology
23 May 2011 | Munich, Germany
Showing 5 of 7 published special sections
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top