Dr. Andreas Ringk Profile

Dr. Andreas Ringk

at Univ Bayreuth

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Author

Publications (4)

Proceedings Article | 20 March 2015 Paper

Tailored molecular glass resists for scanning probe lithography

Christian Neuber, Hans-Werner Schmidt, Peter Strohriegl, Andreas Ringk, Tristan Kolb, Andreas Schedl, Vincent Fokkema, Marijn G. van Veghel, Mike Cooke, Colin Rawlings, Urs Dürig, Armin Knoll, Jean- François de Marneffe, Ziad el Otell, Marcus Kaestner, Yana Krivoshapkina, Matthias Budden, Ivo Rangelow

Proceedings Volume 9425, 94250E (2015) https://doi.org/10.1117/12.2085734

KEYWORDS: Glasses, Scanning probe lithography, Etching, Thin films, Optical lithography, Plasma etching, Resistance, Electron beam lithography, Lithography, Crystals

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Proceedings Article | 17 March 2015 Paper

Molecular glass resist performance for nano-pattern transfer

Ziad el Otell, Andreas Ringk, Tristan Kolb, Christian Neuber, Leander Hansel, Jean-François de Marneffe

Proceedings Volume 9428, 94280J (2015) https://doi.org/10.1117/12.2085828

KEYWORDS: Etching, Glasses, Surface roughness, Refractive index, Plasma, Optical lithography, Scanning probe lithography, Atomic force microscopy, Photoresist materials, Lithography

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Proceedings Article | 28 March 2014 Paper

Molecular glass resists for scanning probe lithography

Christian Neuber, Andreas Ringk, Tristan Kolb, Florian Wieberger, Peter Strohriegl, Hans-Werner Schmidt, Vincent Fokkema, Mike Cooke, Colin Rawlings, Urs Dürig, Armin Knoll, Jean-Francois de Marneffe, Peter De Schepper, Marcus Kaestner, Yana Krivoshapkina, Matthias Budden, Ivo Rangelow

Proceedings Volume 9049, 90491V (2014) https://doi.org/10.1117/12.2047108

KEYWORDS: Glasses, Etching, Scanning probe lithography, Lithography, Optical lithography, Silicon, Electron beam lithography, Polymers, Resistance, Photoresist processing

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Proceedings Article | 11 October 2012 Paper

N-type self-assembled monolayer field-effect transistors

Andreas Ringk, Xiaoran Li, Fatemeh Gholamrezaie, Edsger C. Smits, Alfred Neuhold, Armin Moser, Gerwin Gelinck, Roland Resel, Dago de Leeuw, Peter Strohriegl

Proceedings Volume 8478, 847813 (2012) https://doi.org/10.1117/12.929535

KEYWORDS: Transistors, Molecules, Self-assembled monolayers, Dielectrics, Field effect transistors, Molecular self-assembly, Semiconductors, Absorption, Electrodes, Gold

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