Mr. Andreas Torsy
at Altis Semiconductor
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 2, 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Semiconductors, Lithography, Reticles, Data modeling, Manufacturing, Software development, Microelectronics, Photomasks, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Reticles, Contamination, Particles, Crystals, Ions, Photomasks, Chemical analysis, Analytical research, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Lithographic illumination, Scanners, Manufacturing, Scanning electron microscopy, Relays, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Data modeling, Visualization, Calibration, Silicon, Printing, Photomasks, Optical proximity correction, SRAF, Model-based design, Process modeling

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