Andreas Torsy
at Altis Semiconductor
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 2, 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Photomasks, Standards development, Semiconductors, Data modeling, Semiconducting wafers, Lithography, Manufacturing, Reticles, Software development, Microelectronics

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Photomasks, Contamination, Particles, Semiconducting wafers, Reticles, Ions, Chemical analysis, Standards development, Crystals, Analytical research

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Optical proximity correction, Scanners, Fiber optic illuminators, Semiconducting wafers, Lithography, Relays, Scanning electron microscopy, Manufacturing, Critical dimension metrology, Lithographic illumination

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: SRAF, Optical proximity correction, Printing, Photomasks, Calibration, Model-based design, Data modeling, Visualization, Process modeling, Silicon

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