Dr. Andreas Verch
at Carl Zeiss SMT GmbH
SPIE Involvement:
Publications (8)

Proceedings Article | 10 April 2024 Poster + Paper
Matthias Roesch, Grizelda Kersteen, Andreas Verch, Maximilian Albert, Philip Heringlake, Klaus Gwosch, Renzo Capelli
Proceedings Volume 12953, 129531F (2024) https://doi.org/10.1117/12.3010001
KEYWORDS: 3D mask effects, Light sources and illumination, Extreme ultraviolet, Simulations, 3D image processing, Extreme ultraviolet lithography, Reticles, Metrology, Image analysis, Diffraction

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 1295304 (2024) https://doi.org/10.1117/12.3011615
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Tantalum, Optical lithography, Scanners, Semiconducting wafers, Design, Logic

Proceedings Article | 12 December 2023 Poster + Paper
Nitesh Pandey, Stefan Hunsche, Adam Lyons, Christoph Hennerkes, Andreas Verch, Maximilian Albert, Grizelda Kersteen, Renzo Capelli, Werner Gillijns, Balakumar Baskaran, Joost Bekaert
Proceedings Volume PC12751, PC127510Z (2023) https://doi.org/10.1117/12.2688109
KEYWORDS: Calibration, Metrology, Scanning electron microscopy, Data modeling, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Computational lithography, Design, Optical proximity correction

Proceedings Article | 22 November 2023 Presentation
Klaus Gwosch, Renzo Capelli, Matthias Roesch, Robert Nicholls, Bruno Langbehn, Michael Mohn, Andreas Verch, Maximilian Albert, Grizelda Kersteen, Alexander Winkler, Carolin Müller, Sven Krannich
Proceedings Volume PC12750, PC127500O (2023) https://doi.org/10.1117/12.2687495
KEYWORDS: Extreme ultraviolet lithography, Scanners, Extreme ultraviolet, Imaging systems, Semiconducting wafers, Printing, Photomasks, Metrology, Lithography, Light sources and illumination

Proceedings Article | 5 October 2023 Paper
Matthias Roesch, Renzo Capelli, Lukas Fischer, Klaus Gwosch, Grizelda Kersteen, Carolin Mueller, Robert Nicholls, Andreas Verch, Alexander Winkler
Proceedings Volume 12802, 128020L (2023) https://doi.org/10.1117/12.2681647
KEYWORDS: Metrology, Extreme ultraviolet lithography, Semiconducting wafers, Photomasks, Reticles, Lithography, EUV optics

Showing 5 of 8 publications
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