Mr. Andreas Vetter Profile

Andreas Vetter

at SUSS MicroOptics SA

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Author

Publications (4)

PROCEEDINGS ARTICLE | March 20, 2018

Mask-aligner Talbot lithography using a 193nm CW light source

Proc. SPIE. 10587, Optical Microlithography XXXI

KEYWORDS: Lithography, Light sources, Continuous wave operation, Lithographic illumination, Crystals, Semiconductor lasers, Diffusers, Photomasks, Beam shaping, Semiconducting wafers

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PROCEEDINGS ARTICLE | March 20, 2018

Enabling proximity mask-aligner lithography with a 193nm CW light source

Proc. SPIE. 10587, Optical Microlithography XXXI

KEYWORDS: Lithography, Continuous wave operation, Microlens array, Lithographic illumination, Diffractive optical elements, Semiconductor lasers, Diffusers, Light sources and illumination, Beam shaping, 193nm lithography

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PROCEEDINGS ARTICLE | February 15, 2018

Semiconductor-based narrow-line and high-brilliance 193-nm laser system for industrial applications

Proc. SPIE. 10511, Solid State Lasers XXVII: Technology and Devices

KEYWORDS: Lithography, Continuous wave operation, Deep ultraviolet, Crystals, Laser applications, Semiconductor lasers, Photomasks, Laser crystals, Nonlinear crystals, Laser systems engineering

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PROCEEDINGS ARTICLE | March 1, 2016

Travelling-wave single-photon detectors integrated with diamond photonic circuits: operation at visible and telecom wavelengths with a timing jitter down to 23 ps

Proc. SPIE. 9750, Integrated Optics: Devices, Materials, and Technologies XX

KEYWORDS: Photodetectors, Diamond, Waveguides, Sensors, Photons, Silicon, Single photon, Superconductors, Integrated optics, Photonic integrated circuits, Picosecond phenomena, Single photon detectors, Nanowires

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