Andreia Figueiredo dos Santos
R&D Manager at SCREEN SPE Germany GmbH
SPIE Involvement:
Area of Expertise:
Process optimization , Lithography , Track process
Profile Summary

Andreia Santos received 2008 her Master's Degree in Chemical Engineering from Aveiro University in Portugal, where she specialized in polymer chemistry and characterization of materials. Her first experience in the semiconductors’ world was in 2011 when she joined Nanium - a wafer-level packaging company - as a photolithography process engineer. Two years later, she moved to Belgium and started to work at JSR Micro – a leading materials supplier - where she had the opportunity to get a deeper understanding of photoresist chemistry. After working for a chip maker and a resist supplier, in 2020 Andreia decided to join Screen’s team at Imec, where she currently works as R&D Manager.
Publications (17)

Proceedings Article | 10 April 2024 Presentation + Paper
Andreia Santos, Wesley Zanders, Elke Caron, Seungjoo Baek, Seonggil Heo, Jelle Vandereyken, Hyo Seon Suh, Douglas Guerrero, Masahiko Harumoto, Tsuyoshi Mitsuashi
Proceedings Volume 12957, 1295717 (2024)
KEYWORDS: Spin on carbon materials, Sustainability, Thermography, Power consumption, Lithography, Displays, Semiconductors, Optical lithography, Materials processing, Extreme ultraviolet

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12957, 129570Z (2024)
KEYWORDS: Semiconducting wafers, Particles, Scanning electron microscopy, Extreme ultraviolet lithography, Scanners, Photoresist materials, Displays, Deformation

Proceedings Article | 9 April 2024 Poster + Paper
Proceedings Volume 12957, 1295720 (2024)
KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Line width roughness, Image processing, Standards development, Line edge roughness, Film thickness, Optical lithography, Metal oxides, Critical dimension metrology

Proceedings Article | 1 December 2023 Presentation + Paper
Proceedings Volume PC12750, PC127500Q (2023)
KEYWORDS: Semiconducting wafers, Contamination, Scanners, Optical lithography, Particles, Extreme ultraviolet, Displays, Extreme ultraviolet lithography, Inspection, Critical dimension metrology

Proceedings Article | 22 November 2023 Poster
Proceedings Volume PC12750, PC127500V (2023)
KEYWORDS: Extreme ultraviolet, Semiconductor manufacturing, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconductors, Semiconducting wafers, Printing, Optical lithography, Metrology

Showing 5 of 17 publications
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