Andrew D. Berwick
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 27 May 2009 Paper
H. Christopher Hamaker, Matthew Jolley, Andrew Berwick
Proceedings Volume 7470, 74700W (2009) https://doi.org/10.1117/12.835194
KEYWORDS: Supercontinuum generation, Printing, Critical dimension metrology, Convolution, Photomasks, Calibration, Etching, Integrated circuits, Integrated circuit design, Lithography

Proceedings Article | 5 November 2005 Paper
Paul Allen, H. Christopher Hamaker, Cris Morgante, Andrew Berwick, Michael White
Proceedings Volume 5992, 59920W (2005) https://doi.org/10.1117/12.633049
KEYWORDS: Critical dimension metrology, Printing, Photoresist processing, Error analysis, Composites, Calibration, Standards development, Plasma etching, Logic, Metals

Proceedings Article | 20 August 2004 Paper
Michael Ungureit, Samuel Howells, T. Chabreck, J. Hubbard, Asher Klatchko, Peter Pirogovsky, Robin Teitzel, Andrew Berwick, B. Skyborg, Paul Allen, Cris Morgante, Michael White
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557806
KEYWORDS: Artificial intelligence, Image enhancement, Evolutionary algorithms, Vestigial sideband modulation, Photomasks, Optical proximity correction, Deep ultraviolet, Scanning electron microscopy, Metals, Field programmable gate arrays

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