Dr. Andrew Burbine
Product Engineer at Siemens EDA
SPIE Involvement:
Publications (14)

Proceedings Article | 22 November 2023 Presentation
Proceedings Volume PC12751, PC127510Q (2023) https://doi.org/10.1117/12.2687822
KEYWORDS: Optical proximity correction, Photomasks, Extreme ultraviolet, Calibration, Semiconducting wafers, Scanning electron microscopy, Printing, Modeling, Machine learning, Data modeling

Proceedings Article | 4 April 2019 Paper
Kostas Adam, Shashidhara Ganjugunte, Clement Moyroud, Kostya Shchehlik, Michael Lam, Andrew Burbine, Germain Fenger, Yuri Granik
Proceedings Volume 10962, 109620F (2019) https://doi.org/10.1117/12.2519848
KEYWORDS: Neural networks, Machine learning, Systems modeling, Optical proximity correction, Data modeling, Process modeling, Calibration, Lithography, Cadmium, Coastal modeling

Proceedings Article | 20 March 2019 Presentation + Paper
Proceedings Volume 10962, 109620B (2019) https://doi.org/10.1117/12.2516101
KEYWORDS: Failure analysis, Critical dimension metrology, Lithography, Logic, Manufacturing, Photomasks, Error analysis, Stochastic processes, Visualization, Optical proximity correction

Proceedings Article | 28 September 2017 Paper
Proceedings Volume 10446, 104460V (2017) https://doi.org/10.1117/12.2281886

SPIE Journal Paper | 19 June 2017
JM3, Vol. 16, Issue 02, 023509, (June 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023509
KEYWORDS: Systems modeling, Data modeling, Lithography, Tolerancing, Binary data, Photomasks, Image transmission, Semiconductors, Reticles

Showing 5 of 14 publications
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