Andrew Burbine
Product Engineer at
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 4 April 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Coastal modeling, Cadmium, Data modeling, Calibration, Neural networks, Machine learning, Optical proximity correction, Systems modeling, Process modeling

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Logic, Visualization, Error analysis, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Failure analysis, Stochastic processes

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference

SPIE Journal Paper | 19 June 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Systems modeling, Data modeling, Lithography, Tolerancing, Binary data, Photomasks, Image transmission, Semiconductors, Reticles

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Wafer-level optics, Metrology, Data modeling, Calibration, Image processing, Scanners, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 20 October 2016
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Lithography, Refractive index, Data modeling, Calibration, Monte Carlo methods, Photomasks, Optical proximity correction, Semiconducting wafers, Statistical modeling, Process modeling

Showing 5 of 13 publications
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