Andrew G. Dinsdale
Sr. Applications Engineer at RAVE LLC
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Nanotechnology, Lithography, Metrology, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Optical proximity correction, Autoregressive models, Cryogenics

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Diffractive optical elements, Image processing, Error analysis, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Factor analysis

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Image processing, Particles, Chromium, Atomic force microscopy, Scanning electron microscopy, Photomasks, Optical proximity correction, Particle contamination, Binary data, Cryogenics

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Quartz, Particles, Inspection, Chromium, Atomic force microscopy, Scanning electron microscopy, Photomasks, Particle contamination, Cryogenics

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Diamond, Diamond machining, Quartz, Image processing, Chromium, Atomic force microscopy, Scanning electron microscopy, Photomasks, Autoregressive models, Standards development

Showing 5 of 7 publications
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