Andrew Estroff
at Rochester Institute of Technology
SPIE Involvement:
Author
Publications (14)

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Diffraction, Image processing, Image filtering, Photomasks, Nanoimprint lithography, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Projection lithography

PROCEEDINGS ARTICLE | March 11, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Metamaterials, Refractive index, Surface plasmons, Deep ultraviolet, Reflection, Dielectrics, Reflectivity, Aluminum, Molybdenum, Tin

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Diffraction, Optical lithography, Deep ultraviolet, Microscopy, Interferometry, Photoresist materials, Double patterning technology, Stimulated emission depletion microscopy, Diffraction gratings

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Electron microscopes, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Optical calibration, Process modeling

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Refractive index, Optical lithography, Imaging systems, Interfaces, Photoresist materials, Near field, Wave propagation, Solids, Photomasks

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Data modeling, Polarization, Calibration, Error analysis, Immersion lithography, Critical dimension metrology, Semiconducting wafers, Reverse engineering, Reverse modeling

Showing 5 of 14 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top