Andrew Estroff
at Rochester Institute of Technology
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Diffraction, Image processing, Image filtering, Photomasks, Nanoimprint lithography, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Projection lithography

Proceedings Article | 11 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Metamaterials, Refractive index, Surface plasmons, Deep ultraviolet, Reflection, Dielectrics, Reflectivity, Aluminum, Molybdenum, Tin

Proceedings Article | 26 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Diffraction, Optical lithography, Deep ultraviolet, Microscopy, Interferometry, Photoresist materials, Double patterning technology, Stimulated emission depletion microscopy, Diffraction gratings

Proceedings Article | 20 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Electron microscopes, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Optical calibration, Process modeling

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Refractive index, Optical lithography, Imaging systems, Interfaces, Photoresist materials, Near field, Wave propagation, Solids, Photomasks

Showing 5 of 14 publications
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