Dr. Andy Goodyear
at Oxford Instruments Plasma Technology Ltd
SPIE Involvement:
Author
Area of Expertise:
Plasma process development , Plasma etching , Plasma deposition , Plasma equipment development , Technology project management
Publications (6)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Etching, Argon, Gallium nitride, Field effect transistors, Reactive ion etching, Chlorine, Semiconducting wafers, Plasma

SPIE Journal Paper | 15 July 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Etching, Silicon, Chemistry, Chlorine, Scanning electron microscopy, Photomasks, Fluorine, Photomicroscopy, Electron beams, Plasma

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Electron beams, Etching, Silicon, Chemistry, Atomic force microscopy, Scanning electron microscopy, Photomasks, Chlorine, Photomicroscopy, Fluorine

Proceedings Article | 17 March 2015 Paper
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Polymethylmethacrylate, Silica, Etching, Silicon, Chemistry, Chromium, Plasma etching, Reactive ion etching, Semiconducting wafers, Plasma

Proceedings Article | 12 May 2004 Paper
Proc. SPIE. 5280, Materials, Active Devices, and Optical Amplifiers
KEYWORDS: Etching, Dry etching, Electrodes, Ions, Chemistry, Photoresist materials, Photomasks, Semiconducting wafers, Plasma systems, Plasma

Showing 5 of 6 publications
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