Andy J. Hazelton
at Intuitive Surgical Inc
SPIE Involvement:
Publications (12)

Proceedings Article | 10 March 2010 Paper
Takahisa Kikuchi, Yosuke Shirata, Masahiko Yasuda, Yasuhiro Iriuchijima, Kengo Takemasa, Ryo Tanaka, Andrew Hazelton, Yuuki Ishii
Proceedings Volume 7640, 76400H (2010)
KEYWORDS: Double patterning technology, Lithography, Optical lithography, Semiconducting wafers, Photoresist processing, Scanning electron microscopy, Immersion lithography, Scanners, Glasses, Overlay metrology

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 72710Y (2009)
KEYWORDS: Extreme ultraviolet lithography, Lithography, Photomasks, Semiconducting wafers, Etching, Reticles, Double patterning technology, Metrology, Process modeling

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72740W (2009)
KEYWORDS: Double patterning technology, Etching, Semiconducting wafers, Lithography, Photomasks, Image processing, Photoresist processing, Reticles, Line width roughness, Overlay metrology

Proceedings Article | 16 March 2009 Paper
Andrew Hazelton, Nobutaka Magome, Shinji Wakamoto, Akira Tokui, Céline Lapeyre, Sébastien Barnola, Guillaume Jullien, Vincent Salvetat
Proceedings Volume 7274, 72740X (2009)
KEYWORDS: Double patterning technology, Optical alignment, Semiconducting wafers, Optical lithography, Distortion, Etching, Overlay metrology, Lithography, Reticles, Logic

SPIE Journal Paper | 1 January 2009
JM3, Vol. 8, Issue 01, 011003, (January 2009)
KEYWORDS: Double patterning technology, Photomasks, Etching, Reticles, Lithography, Optical lithography, Semiconducting wafers, Image processing, Photoresist processing, Deposition processes

Showing 5 of 12 publications
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