Andy J. Hazelton
at Intuitive Surgical Inc
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Glasses, Scanners, Scanning electron microscopy, Double patterning technology, Immersion lithography, Photoresist processing, Semiconducting wafers, Overlay metrology

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Reticles, Metrology, Etching, Photomasks, Extreme ultraviolet lithography, Double patterning technology, Semiconducting wafers, Process modeling

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Reticles, Logic, Optical lithography, Etching, Distortion, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Reticles, Etching, Image processing, Photomasks, Line width roughness, Double patterning technology, Photoresist processing, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | 1 January 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Double patterning technology, Photomasks, Etching, Reticles, Lithography, Optical lithography, Semiconducting wafers, Image processing, Photoresist processing, Deposition processes

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Reticles, Logic, Interferometers, Etching, Distortion, Photomasks, Double patterning technology, Photoresist processing, Semiconducting wafers

Showing 5 of 12 publications
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