Dr. Andrew T. Jamieson
Process Engineer at Intel Corp
SPIE Involvement:
Publications (14)

Proceedings Article | 29 March 2013 Paper
Andrew Jamieson, Bennett Olson, Maiying Lu, Nathan Wilcox
Proceedings Volume 8682, 86820Y (2013) https://doi.org/10.1117/12.2014527
KEYWORDS: Photomasks, Electron beams, Extreme ultraviolet, Laser phosphor displays, Line edge roughness, Manufacturing, EUV optics, Electron beam lithography, Optical lithography, Semiconducting wafers

Proceedings Article | 14 October 2011 Paper
Andrew Jamieson, Yong Kwan Kim, Bennett Olson, Maiying Lu, Nathan Wilcox
Proceedings Volume 8166, 816616 (2011) https://doi.org/10.1117/12.898901
KEYWORDS: Photoresist processing, Photomasks, Electron beams, Manufacturing, Line edge roughness, Electron beam lithography, Semiconducting wafers, Laser phosphor displays, Lithography, Etching

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 78230B (2010) https://doi.org/10.1117/12.868037
KEYWORDS: Laser phosphor displays, Etching, Backscatter, SRAF, Electron beams, Line edge roughness, Photomasks, Manufacturing, Inspection, Image quality

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69241G (2008) https://doi.org/10.1117/12.772955
KEYWORDS: Photomasks, Optical lithography, Glasses, Image resolution, Chromium, Etching, 3D modeling, Electron beam lithography, Defect inspection, Semiconducting wafers

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 634906 (2006) https://doi.org/10.1117/12.692939
KEYWORDS: Scanning electron microscopy, Photomasks, Scatterometry, Photoresist processing, Semiconducting wafers, Critical dimension metrology, Diffractive optical elements, Diffusion, Metrology, Scatter measurement

Showing 5 of 14 publications
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