Dr. Andrew T. Jamieson
Process Engineer at Intel Corp
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Electron beam lithography, Electron beams, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Line edge roughness, Semiconducting wafers, EUV optics, Laser phosphor displays

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Etching, Manufacturing, Photomasks, Line edge roughness, Photoresist processing, Semiconducting wafers, Laser phosphor displays

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Electron beams, Backscatter, Etching, Manufacturing, Inspection, Image quality, Photomasks, SRAF, Line edge roughness, Laser phosphor displays

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Electron beam lithography, Optical lithography, Etching, Glasses, Image resolution, Chromium, 3D modeling, Photomasks, Semiconducting wafers, Defect inspection

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Metrology, Diffractive optical elements, Diffusion, Scanning electron microscopy, Scatterometry, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Scatter measurement

Showing 5 of 14 publications
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