Andrew M. Jost
Applications Engineer at Mentor Graphics Corp
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | November 9, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Data modeling, Visualization, Databases, Metals, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Data integration, Back end of line

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Data modeling, Metals, Error analysis, Computer simulations, Optical proximity correction, Optics manufacturing, Model-based design, Process modeling, Design for manufacturability

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Visualization, Calibration, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Process modeling

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Reticles, Data modeling, Calibration, Image processing, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Reticles, Metrology, Logic, Time metrology, Precision measurement, Distance measurement, Photomasks, Algorithm development, Binary data, Standards development

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Logic, Metals, Manufacturing, Inspection, Photomasks, Optical proximity correction, Semiconducting wafers, Performance modeling

Showing 5 of 7 publications
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