Dr. Andrew W. Metz
Sr. Process Engineer at TEL Technology Ctr America LLC
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11615, Advanced Etch Technology and Process Integration for Nanopatterning X
KEYWORDS: Optical lithography, Capacitors, Capacitance, Optical resolution, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, High volume manufacturing, Critical dimension metrology

Proceedings Article | 3 April 2020 Presentation + Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Carbon, Lithography, Optical lithography, Etching, Extreme ultraviolet lithography

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX

Proceedings Article | 20 March 2019 Paper
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Optical lithography, Etching, Polymers, Dielectrics, Silicon, Plasma etching, Silicon carbide, Fluorine, Polymer thin films, Plasma

SPIE Journal Paper | 31 July 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Etching, Extreme ultraviolet, Line edge roughness, Optical lithography, Line width roughness, Silicon, Double patterning technology, Dielectrics, Metals, System on a chip

Showing 5 of 24 publications
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