Andrew R. Mikkelson
Lab Program Manager/Unix Administrator at Univ of Wisconsin Madison
SPIE Involvement:
Author
Publications (28)

SPIE Journal Paper | 1 October 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Particles, Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Analytical research, Finite element methods, Extreme ultraviolet, Thin films, Dielectrics

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, Interferometry, Photography, Computer aided design, Interferometers, Extreme ultraviolet, Beam expanders, Lithography

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Particles, Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Analytical research, Finite element methods, Extreme ultraviolet, Thin films, Dielectrics

Proceedings Article | 2 May 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Extreme ultraviolet lithography, Interferometry, Photomasks, Reticles, Data modeling, 3D modeling, Mathematical modeling, Photography, Image quality, Control systems

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Extreme ultraviolet lithography, Reticles, Photomasks, Interferometry, 3D modeling, Standards development, Kinematics, Semiconductors, Lithographic illumination, Mechanics

Showing 5 of 28 publications
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