Dr. Andrew J. Moore
at Luminescent Technologies Inc
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Diffractive optical elements, Manufacturing, Computer simulations, Printing, Image quality, Photomasks, SRAF

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Semiconductors, Lithography, Manufacturing, Computer simulations, Photomasks, SRAF, Chemical elements, Tolerancing, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Semiconductors, Lithography, Light sources, Manufacturing, Quality measurement, Scanning electron microscopy, Printing, Image quality, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Lithography, Reticles, Calibration, Silicon, Scanning electron microscopy, Optical inspection, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Lithography, Image segmentation, Manufacturing, Printing, Image quality, Photomasks, Optical proximity correction, Inverse optics, Resolution enhancement technologies

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Wafer-level optics, Lithography, Calibration, Image segmentation, Manufacturing, Inspection, Photomasks, Optical proximity correction, Semiconducting wafers, Vestigial sideband modulation

Showing 5 of 6 publications
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