Dr. Andrew J. Moore
at Luminescent Technologies Inc
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: SRAF, Photomasks, Manufacturing, Image quality, Lithography, Diffractive optical elements, Computer simulations, Lithographic illumination, Printing, Optical lithography

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Photomasks, SRAF, Lithography, Semiconductors, Manufacturing, Computer simulations, Phase shifts, Tolerancing, Resolution enhancement technologies, Chemical elements

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Photomasks, Lithography, Image quality, Semiconductors, Semiconducting wafers, Printing, Scanning electron microscopy, Light sources, Quality measurement, Manufacturing

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photomasks, Lithography, Optical proximity correction, Silicon, Calibration, Scanning electron microscopy, Semiconducting wafers, Semiconductors, Optical inspection, Reticles

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photomasks, Optical proximity correction, Lithography, Image segmentation, Image quality, Resolution enhancement technologies, Manufacturing, Semiconductors, Printing, Inverse optics

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Vestigial sideband modulation, Inspection, Wafer-level optics, Calibration, Manufacturing, Image segmentation

Showing 5 of 6 publications
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