Dr. Andrew J. Muray
Senior Staff Engineer at Nanoport Technologies
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Reticles, FT-IR spectroscopy, Optical lithography, Data modeling, Photoresist materials, Photomasks, Stereolithography, Model-based design, Resolution enhancement technologies

Proceedings Article | 26 March 1993
Proc. SPIE. 1809, 12th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Lithography, Etching, Quartz, Chromium, Scanning electron microscopy, Signal processing, Photomasks, Optical alignment, Overlay metrology, Phase shifts

Proceedings Article | 1 January 1992
Proc. SPIE. 1604, 11th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Etching, Quartz, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Semiconducting wafers, Gallium, Phase shifts

Proceedings Article | 1 July 1991
Proc. SPIE. 1464, Integrated Circuit Metrology, Inspection, and Process Control V
KEYWORDS: Electron beam lithography, Reticles, Metrology, Inspection, Process control, Photomasks, Integrated circuits, Photomicroscopy, Overlay metrology, Phase shifts

Proceedings Article | 1 March 1991
Proc. SPIE. 1496, 10th Annual Symp on Microlithography
KEYWORDS: Lithography, Electron beam lithography, Etching, Metals, Process control, Photomasks, Mask making, Critical dimension metrology, Photoresist processing, Standards development

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