Dr. Andrew R. Neureuther
Professor Emeritus at Univ of California Berkeley
SPIE Involvement:
Fellow status | Conference Program Committee | Author | Instructor
Publications (197)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Diffraction, Mirrors, Deep ultraviolet, Reflection, Scattering, Light scattering, 3D modeling, Scatterometry, Photomasks, Extreme ultraviolet

SPIE Journal Paper | December 9, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Photomasks, Etching, Extreme ultraviolet, Finite-difference time-domain method, Diffraction, Printing, Reflectivity, Extreme ultraviolet lithography, SRAF, Phase shifts

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Photomasks, Extreme ultraviolet

PROCEEDINGS ARTICLE | August 30, 2017
Proc. SPIE. 10320, An Introduction to Biological and Artificial Neural Networks for Pattern Recognition

SPIE Journal Paper | May 16, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Signal to noise ratio, Extreme ultraviolet, Inspection, Defect detection, Interference (communication)

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Energy efficiency, Scattering, Spectroscopy, Quantum efficiency, Chemistry, Electron microscopes, Scanning electron microscopy, Photoresist materials, Monte Carlo methods, Solids, Extreme ultraviolet, Extreme ultraviolet lithography, Ranging, Chemically amplified resists

Showing 5 of 197 publications
Conference Committee Involvement (8)
Design-Process-Technology Co-optimization for Manufacturability XIII
24 February 2019 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XII
28 February 2018 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XI
1 March 2017 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability X
24 February 2016 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability IX
25 February 2015 | San Jose, California, United States
Showing 5 of 8 published special sections
Course Instructor
SC102: Optical Lithography Modeling
This course presents the theory and applications of optical lithography simulation tools. Using examples, practical applications to typical material and image problems will be discussed.
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