Prof. Andrew R. Neureuther
Professor Emeritus at Univ of California Berkeley
SPIE Involvement:
Conference Program Committee | Author | Instructor
Publications (208)

Proceedings Article | 8 April 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Chemical species, Metals, Molecules, Quantum efficiency, Chemistry, Ionization, Extreme ultraviolet, Photochemistry, Tin, Absorption

Proceedings Article | 24 March 2020
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Data modeling, Error analysis, Inspection, Printing, Photoresist materials, Extreme ultraviolet lithography, Stochastic processes, Statistical modeling

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Diffraction, Multilayers, Scattering, Reflectivity, 3D modeling, Phase retrieval, Scatterometry, Reflectometry, Photomasks, Extreme ultraviolet

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Diffusion, Chemistry, Atomic force microscopy, Scanning electron microscopy, Photoresist materials, Line width roughness, Critical dimension metrology, Photoresist processing, Stochastic processes, Edge roughness

Proceedings Article | 20 November 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Polymers, Molecules, Electrons, Quantum efficiency, Chemistry, Ionization, Extreme ultraviolet, Extreme ultraviolet lithography, Phase measurement, Absorption