Dr. Andrew R. Romano
Worldwide Technical Marketing Manager at Lam Research Corp
SPIE Involvement:
Publications (23)

Proceedings Article | 2 April 2007 Paper
Francis Houlihan, Alberto Dioses, Medhat Toukhy, Andrew Romano, Joseph Oberlander, HengPeng Wu, Salem Mullen, Alexandra Krawicz, PingHung Lu, Mark Neisser
Proceedings Volume 6519, 65190L (2007) https://doi.org/10.1117/12.713436
KEYWORDS: Arsenic, Resistance, Fluorine, Polymers, Prototyping, Lithography, Photoresist processing, Semiconducting wafers, Fourier transforms, Bottom antireflective coatings

Proceedings Article | 11 April 2006 Paper
Munirathna Padmanaban, Andrew Romano, Guanyang Lin, Simon Chiu, Allen Timko, Frank Houlihan, Dalil Rahman, S. Chakrapani, T. Kudo, Ralph Dammel, Karen Turnquest, Georgia Rich, Scott Schuetter, Timothy Shedd, Gregory Nellis
Proceedings Volume 6153, 615307 (2006) https://doi.org/10.1117/12.659392
KEYWORDS: Thin film coatings, Lithography, Polymers, Line edge roughness, Semiconducting wafers, Photoresist processing, Line width roughness, Immersion lithography, Photoresist materials, Fourier transforms

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 615317 (2006) https://doi.org/10.1117/12.659465
KEYWORDS: Line edge roughness, Line width roughness, Polymers, Semiconducting wafers, Lithography, Transistors, Diffusion, Photoresist processing, Critical dimension metrology, Control systems

SPIE Journal Paper | 1 October 2005
Christoph Hohle, Nicole Heckmann, Michael Sebald, Matthias Markert, Nickolay Stepanenko, Francis Houlihan, Andrew Romano, Raj Sakamuri, David Rentkiewicz, Ralph Dammel
JM3, Vol. 4, Issue 04, 043009, (October 2005) https://doi.org/10.1117/12.10.1117/1.2131101
KEYWORDS: Etching, Polymers, Surface roughness, Fluorine, Plasmas, Scanning electron microscopy, Resistance, Oxides, Plasma etching, Chlorine

Proceedings Article | 4 May 2005 Paper
Francis Houlihan, Raj Sakamuri, Keino Hamilton, Alla Dimerli, David Rentkiewicz, Andrew Romano, Ralph Dammel, Yayi Wei, Nickolay Stepanenko, Michael Sebald, Christoph Hohle, Will Conley, Daniel Miller, Toshiro Itani, Masato Shigematsu, Etsuro Kawaguchi
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601810
KEYWORDS: Thin film coatings, Coating, Contamination, Scanning electron microscopy, Semiconducting wafers, Binary data, Photomasks, Lithography, Deep ultraviolet, Phase shifts

Showing 5 of 23 publications
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