Dr. Andrew R. Romano
Worldwide Technical Marketing Manager at Lam Research Corp
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 2 April 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Arsenic, Resistance, Fluorine, Polymers, Prototyping, Lithography, Photoresist processing, Semiconducting wafers, Fourier transforms, Bottom antireflective coatings

Proceedings Article | 11 April 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Thin film coatings, Lithography, Polymers, Line edge roughness, Semiconducting wafers, Photoresist processing, Line width roughness, Immersion lithography, Photoresist materials, Fourier transforms

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Line edge roughness, Line width roughness, Polymers, Semiconducting wafers, Lithography, Transistors, Diffusion, Photoresist processing, Critical dimension metrology, Control systems

SPIE Journal Paper | 1 October 2005
JM3 Vol. 4 Issue 04
KEYWORDS: Etching, Polymers, Surface roughness, Fluorine, Plasmas, Scanning electron microscopy, Resistance, Oxides, Plasma etching, Chlorine

Proceedings Article | 4 May 2005 Paper
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Thin film coatings, Coating, Binary data, Photomasks, Lithography, Phase shifts, Semiconducting wafers, Contamination, Deep ultraviolet, Absorbance

Showing 5 of 23 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top