Dr. Andrew R. Romano
Worldwide Technical Marketing Manager at Lam Research Corp
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 2 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Polymers, Resistance, Fourier transforms, Fluorine, Photoresist processing, Semiconducting wafers, Arsenic, Prototyping, Bottom antireflective coatings

Proceedings Article | 11 April 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Polymers, Fourier transforms, Photoresist materials, Line width roughness, Immersion lithography, Line edge roughness, Thin film coatings, Photoresist processing, Semiconducting wafers

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Polymers, Diffusion, Control systems, Line width roughness, Transistors, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

SPIE Journal Paper | 1 October 2005
JM3 Vol. 4 Issue 04
KEYWORDS: Etching, Polymers, Surface roughness, Fluorine, Plasmas, Scanning electron microscopy, Resistance, Oxides, Plasma etching, Chlorine

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Contamination, Deep ultraviolet, Coating, Photomasks, Absorbance, Thin film coatings, Semiconducting wafers, Binary data, Phase shifts

Showing 5 of 23 publications
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