Dr. Andrew Skumanich
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SPIE Involvement:
Conference Program Committee | Author
Publications (20)

PROCEEDINGS ARTICLE | April 29, 2004
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Metrology, Optical lithography, Data modeling, Etching, Control systems, Scatterometry, Process control, Feedback loops, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 29, 2004
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Semiconductors, Principal component analysis, Data modeling, Etching, Data acquisition, Process control, Neural networks, Plasma etching, Reactive ion etching, Process modeling

PROCEEDINGS ARTICLE | July 12, 2002
Proc. SPIE. 4692, Design, Process Integration, and Characterization for Microelectronics
KEYWORDS: Oxides, Silica, Etching, Particles, Copper, Silicon, Inspection, Dielectrophoresis, Aluminum, Semiconducting wafers

PROCEEDINGS ARTICLE | July 12, 2002
Proc. SPIE. 4692, Design, Process Integration, and Characterization for Microelectronics
KEYWORDS: Metrology, Etching, Metals, Particles, Resistance, Inspection, Scanning electron microscopy, Process control, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | April 23, 2001
Proc. SPIE. 4406, In-Line Characterization, Yield, Reliability, and Failure Analysis in Microelectronic Manufacturing II
KEYWORDS: Wafer-level optics, Oxides, Statistical analysis, Etching, Particles, Copper, Silicon, Inspection, Dielectrophoresis, Semiconducting wafers

PROCEEDINGS ARTICLE | June 2, 2000
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Lithography, Metrology, Statistical analysis, Etching, Inspection, Process control, Microelectronics, Wafer inspection, Semiconducting wafers, Defect inspection

Showing 5 of 20 publications
Conference Committee Involvement (4)
Data Analysis and Modeling for Patterning Control III
23 February 2006 | San Jose, California, United States
Data Analysis and Modeling for Process Control II
3 March 2005 | San Jose, California, United States
Data Analysis and Modeling for Process Control
26 February 2004 | Santa Clara, California, United States
Process and Materials Characterization and Diagnostics in IC Manufacturing II
27 February 2003 | Santa Clara, CA, United States
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