Dr. Andrew T. Sowers
Group Engineering Leader at Intel Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Signal to noise ratio, Lithography, Electron beam lithography, Electrons, Photomasks, Beam shaping, Optical proximity correction, Raster graphics, Photomask technology, Vestigial sideband modulation

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Optical lithography, Data modeling, Manufacturing, Photomasks, Beam shaping, Optical proximity correction, Manufacturing equipment, Model-based design, Vestigial sideband modulation

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