Prof. Andrew K. Whittaker
Professor at Univ of Queensland
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Publications (17)

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Electron beam lithography, Refractive index, Polymers, Photoresist materials, Polymerization, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Semiconducting wafers, Polymer thin films

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Oxides, Electron beam lithography, Optical lithography, Nanoparticles, Metals, Particles, Materials processing, Scanning electron microscopy, Transmission electron microscopy, Photoresist materials, Extreme ultraviolet lithography, Hafnium, Zirconium, Photoresist developing

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Lithography, Electron beam lithography, Polymers, Annealing, Atomic force microscopy, Photoresist materials, Directed self assembly, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Etching, Polymers, Glasses, Photoresist materials, Directed self assembly, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Reactive ion etching

PROCEEDINGS ARTICLE | December 24, 2011
Proc. SPIE. 8204, Smart Nano-Micro Materials and Devices
KEYWORDS: Plasmonics, Nanostructures, Finite-difference time-domain method, Stars, Nanoparticles, Silver, Numerical simulations, Computer simulations, Near field, Nano optics

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Polymers, Water, Sulfur, Coating, Scanning electron microscopy, Absorbance, Double patterning technology, Line edge roughness, 193nm lithography

Showing 5 of 17 publications
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