Mr. Andrew G. Zanzal Profile

Andrew G. Zanzal

Vice President of Sales at Benchmark Technologies

SPIE Involvement:

Author

Area of Expertise:

Mask and reticles

Publications (7)

Proceedings Article | 9 April 2024 Presentation + Paper

Challenges of photomask-based greyscale lithography with a highly-sensitive positive photoresist designed for>100µm deep greyscale patterns

Christine Schuster, Marina Heinrich, Anja Voigt, Andrew Zanzal, Patrick Reynolds, Stephen DeMoor, Gerda Ekindorf, Arne Schleunitz, Gabi Grützner

Proceedings Volume 12956, 129560H (2024) https://doi.org/10.1117/12.3010852

KEYWORDS: Film thickness, Photoresist materials, Lithography, Ultraviolet radiation, Binary data, Grayscale lithography, Standards development, Optical lithography, Glasses, Photomasks

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Proceedings Article | 9 April 2024 Poster + Paper

2.5D-patterning via i-line grayscale exposure for photonic structures and micro lens arrays

Sebastian Schermer, Christian Helke, Balaji Sake, Andrew Zanzal, Patrick Reynolds, Stephen DeMoor, Anja Voigt, Danny Reuter

Proceedings Volume 12956, 129560J (2024) https://doi.org/10.1117/12.3008954

KEYWORDS: Reticles, Etching, Dry etching, Manufacturing, Lens arrays, Grayscale lithography, Photoresist processing, Design, Scanning electron microscopy, Electron beam lithography

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Proceedings Article | 20 October 2006 Paper

Adding grayscale layer to chrome photomasks

David Poon, James Dykes, Chinheng Choo, Jimmy T. Tsui, Jun Wang, Glenn Chapman, Yuqiang Tu, Patrick Reynolds, Andrew Zanzal

Proceedings Volume 6349, 634931 (2006) https://doi.org/10.1117/12.686599

KEYWORDS: Photomasks, Argon ion lasers, Binary data, Photoresist materials, Reticles, Optical lithography, Thin films, Calibration, Glasses, Oxidation

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Proceedings Article | 6 May 2005 Paper

Resist sensitivity and thickness-based beam count optimization for parallel low energy E-beam exposure systems

Jacques Beauvais, Eric Lavallee, Dominique Drouin, Andrew Zanzal, Prasad Kelkar

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599723

KEYWORDS: Electron beam lithography, Electron beams, Line edge roughness, Semiconducting wafers, Photomasks, Lithography, Systems modeling, Standards development, Line width roughness, Tolerancing

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Proceedings Article | 6 May 2005 Paper

Fabrication of a 3D nano-imprint template with a conformal dry vapor deposited electron beam resist

Jacques Beauvais, Eric Lavallee, Andrew Zanzal, Dominique Drouin, Kien Mun Lau, Teodor Veres, Bo Cui

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599795

KEYWORDS: Etching, Lithography, Photomasks, Electron beam lithography, Electron beams, Photomicroscopy, Reactive ion etching, Silica, Metals, Optical lithography

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Proceedings Article | 26 February 2004 Paper

Picometer-resolution assessment of the period constancy in a FBG phase mask

Yves Jourlin, Alexandre Tishchenko, C. Pedri, Andrew Zanzal, James Unruh

Proceedings Volume 5252, (2004) https://doi.org/10.1117/12.513696

KEYWORDS: Sensors, Head, Fiber Bragg gratings, Spatial frequencies, Quartz, Etching, Photomasks, Inverse problems, Electron beams, Standards development

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Proceedings Article | 12 February 1997 Paper

Demonstrating next-generation CD uniformity with today's tools and processes

Jacques Waelpoel, Jan van Schoot, Andrew Zanzal

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301228

KEYWORDS: Reticles, Critical dimension metrology, Semiconducting wafers, Manufacturing, Scanners, Lithography, Printing, Semiconductors, Wet etching, Bismuth

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Showing 5 of 7 publications

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