Andrey Esaulov
at Univ of Nevada Reno
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Optical lithography, Sensors, Electrons, Ions, Physics, Computer simulations, Xenon, Ionization, Extreme ultraviolet, Plasma

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Optical lithography, Electrodes, Electrons, Ions, Physics, Computer simulations, Xenon, Ionization, Extreme ultraviolet, Plasma

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