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Dr. Andrey Nikipelov
at ASML Netherlands BV
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Author
Publications (4)
Proceedings Article | 5 March 2021 Presentation + Paper
Particle removal tool to repair particle defects on EUV reticles
Proceedings Volume 11609, 116090N (2021) https://doi.org/10.1117/12.2583981
KEYWORDS: Particles, Reticles, Extreme ultraviolet, Tin, X-rays, Statistical analysis, Scanning electron microscopy, Scanners, Photomasks, Pellicles
Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Morphology change and release of tin and lead micro-particles from substrates in hydrogen plasma
Proceedings Volume 11609, 116091F (2021) https://doi.org/10.1117/12.2581666
KEYWORDS: Plasma, Particles, Hydrogen, Tin, Lead, Extreme ultraviolet lithography, Ions, Semiconducting wafers, Reticles, Extreme ultraviolet
Proceedings Article | 23 March 2020 Paper
Understanding EUV-induced plasma and application to particle contamination control in EUV scanners
Mark van de Kerkhof, Andrei Yakunin, Vladimir Kvon, Ferdi van de Wetering, Selwyn Cats, Luuk Heijmans, Andrey Nikipelov, Adam Lassise, Vadim Banine
Proceedings Volume 11323, 113230Y (2020) https://doi.org/10.1117/12.2551020
KEYWORDS: Plasma, Particles, Ions, Extreme ultraviolet, Scanners, Hydrogen, Reticles, Particle contamination
Proceedings Article | 26 March 2019 Presentation + Paper
Advanced particle contamination control in EUV scanners
Proceedings Volume 10957, 109570U (2019) https://doi.org/10.1117/12.2514874
KEYWORDS: Particles, Reticles, Scanners, Pellicles, Plasma, Extreme ultraviolet, Particle contamination
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