Dr. Andrzej Karawajczyk
at Mycronic AB
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Electron beam lithography, Optical lithography, Deep ultraviolet, Calibration, Control systems, Spatial light modulators, Photomasks, Image enhancement, Raster graphics, Neodymium

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Deep ultraviolet, Image processing, Manufacturing, Laser applications, Printing, Spatial light modulators, Solids, Photomasks, Raster graphics

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Coherence imaging, Electron beams, Electronics, Deep ultraviolet, Particles, Laser applications, Spatial light modulators, Photomasks, Excimer lasers, Optical proximity correction

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Mirrors, Deep ultraviolet, Manufacturing, Image resolution, Spatial light modulators, Micromirrors, Photomasks, Critical dimension metrology, Analog electronics

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Mirrors, Imaging systems, Spatial filters, Calibration, Printing, Spatial light modulators, Micromirrors, Charge-coupled devices, Critical dimension metrology, CCD image sensors

Showing 5 of 6 publications
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