Andy Ma
Senior Staff Engineer at Intel Corp
SPIE Involvement:
Publications (22)

Proceedings Article | 18 April 2013 Paper
Milton Godwin, Teki Ranganath, Andy Ma
Proceedings Volume 8681, 868112 (2013)
KEYWORDS: Inspection, Quartz, Particles, Defect detection, Calcium, Extreme ultraviolet, Silica, Phase modulation, Photomasks, Defect inspection

Proceedings Article | 23 March 2012 Paper
Takeya Shimomura, Arun John Kadaksham, Matt House, Andy Ma, Frank Goodwin
Proceedings Volume 8322, 83221Y (2012)
KEYWORDS: Extreme ultraviolet, Photomasks, Particles, Inspection, Reflectivity, Extreme ultraviolet lithography, Ruthenium, Semiconductors, Lithography, Laser processing

Proceedings Article | 23 March 2012 Paper
V. Jindal, P. Kearney, J. Sohn, J. Harris-Jones, A. John, M. Godwin, A. Antohe, R. Teki, A. Ma, F. Goodwin, A. Weaver, P. Teora
Proceedings Volume 8322, 83221W (2012)
KEYWORDS: Extreme ultraviolet, Photomasks, Ions, Extreme ultraviolet lithography, Ion beams, Particles, Silicon, Molybdenum, Ruthenium, Chemical species

Proceedings Article | 23 March 2012 Paper
Jaehyuck Choi, Steve Novak, Yudhishthir Kandel, Greg Denbeaux, Han-shin Lee, Andy Ma, Frank Goodwin
Proceedings Volume 8322, 83220S (2012)
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Ions, Extreme ultraviolet, Scanning probe microscopy, Chemical analysis, Air contamination, Industrial chemicals, Mask cleaning, Contamination

Proceedings Article | 23 March 2012 Paper
R. Teki, A. John Kadaksham, M. House, J. Harris-Jones, A. Ma, S. Babu, A. Hariprasad, P. Dumas, R. Jenkins, J. Provine, A. Richmann, J. Stowers, S. Meyers, U. Dietze, T. Kusumoto, T. Yatsui, M. Ohtsu, F. Goodwin
Proceedings Volume 8322, 83220B (2012)
KEYWORDS: Polishing, Chemical mechanical planarization, Surface finishing, Extreme ultraviolet, Amorphous silicon, Particles, Thin film coatings, Thin films, Surface roughness, Silica

Showing 5 of 22 publications
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