Andy Ma
Senior Staff Engineer at Intel Corp
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 18 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Defect detection, Phase modulation, Silica, Quartz, Particles, Calcium, Inspection, Photomasks, Extreme ultraviolet, Defect inspection

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Chemical species, Particles, Ions, Silicon, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Ruthenium

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Semiconductors, Lithography, Particles, Laser processing, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Amorphous silicon, Thin films, Polishing, Silica, Particles, Surface roughness, Extreme ultraviolet, Thin film coatings, Surface finishing, Chemical mechanical planarization

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Contamination, Air contamination, Ions, Photomasks, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Scanning probe microscopy, Mask cleaning, Industrial chemicals

Showing 5 of 22 publications
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