Andy Ma
Senior Staff Engineer at Intel Corp
SPIE Involvement:
Author
Publications (22)

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Defect detection, Phase modulation, Silica, Quartz, Particles, Calcium, Inspection, Photomasks, Extreme ultraviolet, Defect inspection

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Chemical species, Particles, Ions, Silicon, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Ruthenium

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Semiconductors, Lithography, Particles, Laser processing, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Amorphous silicon, Thin films, Polishing, Silica, Particles, Surface roughness, Extreme ultraviolet, Thin film coatings, Surface finishing, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Contamination, Air contamination, Ions, Photomasks, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Scanning probe microscopy, Mask cleaning, Industrial chemicals

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Optical lithography, Cadmium, Deep ultraviolet, Reflectivity, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning probe microscopy, Ruthenium

Showing 5 of 22 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top