Anett Heinrich
at NaMLab gGmbH
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Ellipsometry, Statistical analysis, Error analysis, Scanning electron microscopy, Spectroscopic ellipsometry, Photomasks, Line width roughness, Critical dimension metrology, Line edge roughness, Chemical elements

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Ellipsometry, Metrology, Modulation, Polarization, Computer simulations, Scanning electron microscopy, Spectroscopic ellipsometry, Photomasks, Critical dimension metrology, Line edge roughness

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Diffraction, Multilayers, Data modeling, Silica, Polarization, Glasses, Spectroscopic ellipsometry, Photomasks, Extreme ultraviolet, Critical dimension metrology

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