Angélique Raley
Manager Process Development at TEL Technology Ctr America LLC
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 6 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Amorphous silicon, Lithography, Optical lithography, Etching, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Oxidation

Proceedings Article | 3 April 2020 Presentation + Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Carbon, Lithography, Optical lithography, Etching, Extreme ultraviolet lithography

Proceedings Article | 25 November 2018 Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Optical lithography, Etching, Scanning electron microscopy, Image filtering, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness

SPIE Journal Paper | 31 July 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Etching, Extreme ultraviolet, Line edge roughness, Optical lithography, Line width roughness, Silicon, Double patterning technology, Dielectrics, Metals, System on a chip

Proceedings Article | 17 April 2018 Paper
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Carbon, Lithography, Etching, Chemistry, Scanning electron microscopy, Photoresist materials, Line width roughness, Plasma enhanced chemical vapor deposition, Extreme ultraviolet lithography, Line edge roughness

Showing 5 of 15 publications
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