Angus Sheng-Ji Chin
Mask Department Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 18 December 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Quartz, Particles, Inspection, Chromium, Digital watermarking, Oxygen, Photomasks, Extreme ultraviolet, Ruthenium, Plasma

SPIE Journal Paper | 16 June 2014
JM3 Vol. 13 Issue 02
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Particles, Semiconducting wafers, Extreme ultraviolet lithography, Deep ultraviolet, Lithography, Critical dimension metrology, Defect detection

Proceedings Article | 28 June 2013 Paper
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Diffractive optical elements, Opacity, Particles, Inspection, Photomasks, SRAF, Cavitation, Acoustics, Binary data, Mask cleaning

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Metrology, Visualization, Opacity, Databases, Inspection, Image analysis, Scanning electron microscopy, Data acquisition, Photomasks, Critical dimension metrology

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Quartz, Particles, Silicon, Manufacturing, Inspection, Photomasks, Semiconductor manufacturing, Chemical analysis, Critical dimension metrology, Mask cleaning

Showing 5 of 12 publications
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