Anice Lee
at Nanya Technology Corp
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Wafer-level optics, Metrology, Etching, Silicon, Reflectometry, Process control, Finite element methods, Critical dimension metrology, Photoresist processing, Semiconducting wafers

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top