Anil Gunay Demirkol
at imec
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Diffractive optical elements, Etching, Scatterometry, Process control, Critical dimension metrology, Semiconducting wafers, Scatter measurement

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