Dr. Anil Karumuri
Engineer-Technology Development at Micron technology
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Silica, Manufacturing, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes, Ruthenium, Standards development

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Multilayers, Sputter deposition, Silicon, Manufacturing, Reflectivity, Ion beams, Photomasks, Extreme ultraviolet, Semiconducting wafers, EUV optics

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top