Anja Vanleenhove
Research Engineer at NXP Semiconductors Belgium NV
SPIE Involvement:
Author
Publications (3)

SPIE Journal Paper | 1 October 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Polymers, Extreme ultraviolet, Polymethylmethacrylate, Electron beam lithography, Fluorine, Magnesium, Photomasks, Liquids, Chemistry, Lithography

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Reticles, Data modeling, Diffusion, Diagnostics, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Nanoimprint lithography, Photoresist processing

Proceedings Article | 26 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Optical lithography, Etching, Photomasks, Double patterning technology, Critical dimension metrology, Line edge roughness, Thin film coatings, Photoresist processing, Phase shifts

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