Dr. Anja Voigt Profile

Dr. Anja Voigt

Product Manager Negative Photoresists at micro resist technology GmbH

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Publications (17)

Proceedings Article | 9 April 2024 Poster + Paper

Assessing hybrid polymers as innovative photolithography material allowing advanced high aspect ratio/high resolution patterns for micro-optics and patterned passivation layers

M. Russew, A. Benker, J. Herrmann, T. Oberbiermann, S. Grützner, M. Koch, J. Wolf, A. Voigt, A. Schleunitz, G. Grützner

Proceedings Volume 12956, 129560R (2024) https://doi.org/10.1117/12.3010843

KEYWORDS: Polymers, Advanced patterning, Film thickness, Two photon polymerization, Passivation, Optical lithography, Micro optics, Liquids, Manufacturing, Lithography

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Proceedings Article | 9 April 2024 Poster + Paper

2.5D-patterning via i-line grayscale exposure for photonic structures and micro lens arrays

Sebastian Schermer, Christian Helke, Balaji Sake, Andrew Zanzal, Patrick Reynolds, Stephen DeMoor, Anja Voigt, Danny Reuter

Proceedings Volume 12956, 129560J (2024) https://doi.org/10.1117/12.3008954

KEYWORDS: Reticles, Etching, Dry etching, Manufacturing, Lens arrays, Grayscale lithography, Photoresist processing, Design, Scanning electron microscopy, Electron beam lithography

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Proceedings Article | 9 April 2024 Presentation + Paper

Novel multi-layer nanoimprint lithography material system enabling nano-patterning of functional optical layers

M. Messerschmidt, M. Lohse, N. Heidensohn, S. Grützner, A. Schleunitz, A. Voigt, G. Grützner

Proceedings Volume 12956, 1295607 (2024) https://doi.org/10.1117/12.3010840

KEYWORDS: Etching, Nanoimprint lithography, Metals, Fabrication, Plasma, Photoresist processing, Coating, Reactive ion etching, Oxygen, Coating thickness

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Proceedings Article | 9 April 2024 Presentation + Paper

Challenges of photomask-based greyscale lithography with a highly-sensitive positive photoresist designed for>100µm deep greyscale patterns

Christine Schuster, Marina Heinrich, Anja Voigt, Andrew Zanzal, Patrick Reynolds, Stephen DeMoor, Gerda Ekindorf, Arne Schleunitz, Gabi Grützner

Proceedings Volume 12956, 129560H (2024) https://doi.org/10.1117/12.3010852

KEYWORDS: Film thickness, Photoresist materials, Lithography, Ultraviolet radiation, Binary data, Grayscale lithography, Standards development, Optical lithography, Glasses, Photomasks

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Proceedings Article | 5 October 2023 Paper

Development of an e-beam/i-line stepper intra-level mix and match approach with the photoresist mr-EBL 6000.5 for PIC related structures such as waveguides, ring resonators and coupling structures

M. Reinhardt, C. Helke, S. Schermer, S. Hartmann, A. Voigt, D. Reuter

Proceedings Volume 12802, 128020E (2023) https://doi.org/10.1117/12.2675558

KEYWORDS: Resonators, Electron beam lithography, Design and modelling, Lithography, Photonic integrated circuits, Ultraviolet radiation, Semiconducting wafers, Photoresist processing, Waveguides, Manufacturing

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Proceedings Article | 1 May 2023 Poster + Paper

Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication

A. Schleunitz, C. Schuster, A. Voigt, M. Russew, M. Lohse, M. Heinrich, G. Grützner

Proceedings Volume 12497, 124970V (2023) https://doi.org/10.1117/12.2661531

KEYWORDS: Photoresist materials, Photopolymers, Lithography, Electron beam lithography, Photoresist processing, Optical lithography, Advanced patterning, Nanofabrication, Manufacturing, Nanoimprint lithography

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Proceedings Article | 1 May 2023 Presentation + Paper

Novel approach of patterning technologies enabling monolithic micro-optical components

J. Wolf, M. Ferstl, A. Voigt, S. Grützner, A. Schleunitz, G. Grützner

Proceedings Volume 12497, 124970F (2023) https://doi.org/10.1117/12.2661529

KEYWORDS: Printing, Inkjet technology, Polymers, Lenses, Manufacturing, Scanning electron microscopy, Optical components, Fabrication, Semiconducting wafers, Optics manufacturing

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Proceedings Article | 1 May 2023 Paper

Pushing deep greyscale lithography beyond 100-µm pattern depth with a novel photoresist

Christine Schuster, Gerda Ekindorf, Anja Voigt, Arne Schleunitz, Gabi Grützner

Proceedings Volume 12497, 124970P (2023) https://doi.org/10.1117/12.2661526

KEYWORDS: Light emitting diodes, Photoresist materials, Grayscale lithography, Bubbles, Ultraviolet radiation, Light absorption, Optical lithography, Coating, Picture Archiving and Communication System

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Proceedings Article | 1 November 2022 Paper

Lithographic performance of resist ma-N 1402 in an e-beam/i-line stepper intra-level mix and match approach

C. Canpolat-Schmidt, G. Heldt, C. Helke, A. Voigt, D. Reuter

Proceedings Volume 12472, 124720J (2022) https://doi.org/10.1117/12.2639447

KEYWORDS: Electron beam lithography, Lithography, Photoresist processing, Scanning electron microscopy, Bottom antireflective coatings, Beam shaping, Silicon

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Proceedings Article | 21 March 2016 Paper

mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning

Stefan Pfirrmann, Robert Kirchner, Olga Lohse, Vitaliy Guzenko, Anja Voigt, Irina Harder, Anett Kolander, Helmut Schift, Gabi Grützner

Proceedings Volume 9779, 977925 (2016) https://doi.org/10.1117/12.2219165

KEYWORDS: Plasma, Dry etching, Electron beams, Polymers, Scanning electron microscopy, Reactive ion etching

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Proceedings Article | 27 March 2014 Paper

Improved adhesion of novolac and epoxy based resists by cationic organic materials on critical substrates for high volume patterning applications

Anja Voigt, Gisela Ahrens, Marina Heinrich, Andrew Thompson, Gabi Gruetzner

Proceedings Volume 9051, 90511K (2014) https://doi.org/10.1117/12.2046258

KEYWORDS: Silicon, Epoxies, Optical lithography, Photoresist processing, Electroplating, Nickel, Head-mounted displays, Copper, Silica, Glasses

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Proceedings Article | 27 March 2014 Paper

Removal of highly crosslinked resists and hybrid polymers for single micro parts fabrication and nanoimprint stamp rework

Anja Voigt, Rainer Engelke, Gisela Ahrens, Franziska Bullerjahn, Arne Schleunitz, Jan Klein, Gabi Grützner

Proceedings Volume 9051, 90511H (2014) https://doi.org/10.1117/12.2046253

KEYWORDS: Etching, Polymers, Nanoimprint lithography, Plasma etching, Plasma, Silicon, Dry etching, Oxygen, Nickel, Gases

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Proceedings Article | 1 September 2011 Paper

Opto-thermal actuation in double layer polymer microcantilevers

C. Martin-Olmos, L. Villanueva, A. Llobera, A. Voigt, G. Gruetzner, G. Abadal, F. Perez-Murano

Proceedings Volume 8107, 81070A (2011) https://doi.org/10.1117/12.897353

KEYWORDS: Polymers, Actuators, Epoxies, Doping, Polymeric actuators, Silicon, Semiconducting wafers, Microelectromechanical systems, Signal detection, Absorption

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Proceedings Article | 2 May 2008 Paper

Advances in fabrication of x-ray masks based on vitreous carbon using a new UV sensitive positive resist

Anja Voigt, Josef Kouba, Marina Heinrich, Gabi Gruetzner, Heinz-Ulrich Scheunemann, I. Rudolph, Christoph Waberski

Proceedings Volume 6792, 679214 (2008) https://doi.org/10.1117/12.798802

KEYWORDS: X-rays, Photomasks, Carbon, Vitreous, Gold, Ultraviolet radiation, X-ray lithography, Electroplating, Beryllium, Photoresist materials

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Proceedings Article | 14 May 2004 Paper

Characterization of new ultrathick chemically amplified positive-tone photoresists suitable for electroplating application

Anja Voigt, Marina Heinrich, Gabi Gruetzner

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535205

KEYWORDS: Photoresist materials, Electroplating, Lithography, Microelectromechanical systems, Packaging, Copper, Polymers, Thin film coatings, Coating, Ultraviolet radiation

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Proceedings Article | 25 June 1999 Paper

Nanometer patterning using ma-N 2400 series DUV negative photoresist and electron beam lithography

Anya Voigt, Harald Elsner, H. Meyer, Gabi Gruetzner

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351078

KEYWORDS: Electron beam lithography, Photoresist materials, Electron beams, Picture Archiving and Communication System, Deep ultraviolet, Etching, Photoresist processing, Lithography, Ultraviolet radiation, Absorbance

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Proceedings Article | 9 June 1995 Paper

Series of AZ-compatible negative photoresists

Anya Voigt, Gabi Gruetzner, E. Sauer, S. Helm, T. Harder, Simone Fehlberg, Juergen Bendig

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210420

KEYWORDS: Photoresist materials, Etching, Lithography, Absorption, Photolysis, Polymers, Deep ultraviolet, Coating, Photoresist developing, Resistance

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Showing 5 of 17 publications

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