Anka Birnstein
at Advanced Mask Technology Center GmbH & Co. KG
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Defect detection, Opacity, Inspection, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Signal detection, Defect inspection

Proceedings Article | 12 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Wafer-level optics, Lithography, Defect detection, Inspection, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Defect detection, Deep ultraviolet, Polarization, Opacity, Inspection, Photomasks, Extreme ultraviolet, Critical dimension metrology, EUV optics, Defect inspection

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Multilayers, Deep ultraviolet, Lenses, Signal attenuation, Scanners, Objectives, Photomasks, Critical dimension metrology, Chemical elements, Semiconducting wafers

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