Dr. Anna Lena Eberle
at Carl Zeiss Microscopy GmbH
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Semiconductors, Electron beams, Sensors, Electron microscopes, Scanning electron microscopy, Electron microscopy

Proceedings Article | 4 September 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Imaging systems, Inspection, Optical inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers, Optics manufacturing, Defect inspection

Proceedings Article | 19 March 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Manufacturing, Inspection, Optical inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers, Optics manufacturing, Prototyping, Defect inspection

Proceedings Article | 16 September 2014
Proc. SPIE. 9236, Scanning Microscopies 2014
KEYWORDS: Beam splitters, Electron beams, Tissues, Sensors, Silicon, Image resolution, Electron microscopes, Scanning electron microscopy, Data acquisition, Brain

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