Ms. Anna Bialous Profile

Anna Bialous

PhD Student at Szewalski Institute of Fluid-Flow Machinery

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Proceedings Article | 15 March 2013

Structure and optical properties of TiO2 thin films prepared by pulsed laser deposition

Anna Białous, Maria Gazda, Gerard Śliwiński

Proc. SPIE. 8770, 17th International School on Quantum Electronics: Laser Physics and Applications

KEYWORDS: Titanium, Protactinium, Crystals, Oxygen, Thin films, Raman spectroscopy, Pulsed laser deposition, Transmittance, Absorption, Titanium dioxide

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Thin TiO2 films prepared by pulsed laser deposition (PLD) in the O2 gas ambient using the bulk metal Ti or pressed TiO2 powder targets were characterized using spectroscopic methods. Films were deposited on SiO2 (001) and SiO2 glass substrates heated up to 300 °C. The deposition process was investigated at laser fluencies from the range of 1 – 3 J/cm2 and at oxygen pressure of 0.1 – 3.2 Pa. The μ-Raman and X-ray diffraction (XRD) spectra of the TiO2 films revealed consistently both the anatase and rutile crystalline phases and a strong dependence of the phase content ratio on target material and deposition conditions. The range of crystallite size determined from XRD bandwidths was between (2-30) nm and (6-14) nm for anatase and rutile, respectively. The film thickness values between 0.74 and 1.65 μm depending on the deposition time were obtained from the transmittance and ellipsometric measurements. Values of the band gap of 3.5-4.1 eV derived from absorption spectra were higher than that of 3.2 eV corresponding to anatase and this difference was ascribed to the relatively small size of the anatase crystallites and presence of rutile, too. The SEM images of films produced under similar conditions from Ti and TiO2 targets revealed porous structures. The highest anatase content was observed for films deposited by ablation of the TiO2 target at moderate laser fluencies below 2 J/cm2 and at oxygen pressure around 1.9 Pa.

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