Anna Szucs
at STMicroelectromics
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Optical lithography, Calibration, Etching, Metals, Image processing, Reliability, 3D modeling, Scanning electron microscopy, 3D metrology, Photomasks, Artificial intelligence, Optical proximity correction, Critical dimension metrology, Evolutionary algorithms

SPIE Journal Paper | April 10, 2015
JM3 Vol. 14 Issue 02
KEYWORDS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Process control, Photomasks, Etching, Logic, Metrology, Lithography, Optical proximity correction

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Data modeling, Calibration, Etching, 3D modeling, Atomic force microscopy, Scanning electron microscopy, Process control, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Calibration, Metals, Scanners, Wavefronts, Scanning electron microscopy, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers

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