Anne-Lise Fabre
at CEA-LETI
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Electron beams, Metrology, Cadmium, Atomic force microscopy, Scanning electron microscopy, Precision measurement, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconductors, Metrology, Silicon, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Line width roughness, Transistors, Critical dimension metrology, Line edge roughness

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